MELEC GmbH
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![]() JOIN OUR SIPP – SUPERIMPOSED PULSE POWER – TECHNOLOGY |
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![]() picture: Helmholtz-Zentrum Dresden-Rossendorf, Germany |
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High Power Pulse Magnetron Sputtering(HPPMS), also known as High Power Impulse Magnetron Sputtering (HiPIMS) is a novel pulse plasma technology for coating applications. New developments in DC pulse power controllers allow very high peak power pulses. Combining DC power or medium frequency (MF) pulse power to HPPMS / HiPIMS processes offers significant advantages in the plasma and surface technologies. This technology is appropriate for single and dual magnetron applications and synchronized pulsed bias. It allows higher process rates for metallic and reactive sputtering applications. Processes such as Co-Sputtering with different target materials using Dual Magnetron Systems and asymmetric bipolar pulse modes are possible. Applicable HPPMS / HiPIMS Pulse packages with superimposed DC or MF sputtering open a new field of applications. MELEC opens a new field of High Pulse Power Plasma Engineering using LabVIEW and National Instruments Components (Win XP or Real-Time Processing). |
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Comparission of DC and HiPIMS coating![]() Ref.: Fraunhofer Institut IST, Braunschweig, Germany |
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DELTA IMPULSE FUNCTIONThe ideal approach of HPPMS / HiPIMS generation is the mathematically known delta impulse function. The delta function is defined by a single pulse of extremely high amplitude – ideally infinite – and extremely short width – ideally close to Zero. By use of the Fourier Transformation (FFT) it can be shown that the delta function contains the highest number of frequency components and amplitudes. The HiPIMS pulse generation approach of the MELEC GmbH pulse generators resembles a delta impulse function due to the flexible adjustment of very short pulse times and long pause times between the pulses and the very high peak power of the pulses. |
Ideal form of function of HPPMS / HIPIMS generation |
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