Products SIPP2000IPC-HPPMS
Superimposed Pulsed Plasma - SIPP2000IPC-HPPMS pulse power controller is capable of operating
with any DC power supply with floating outputs to upgrade your current averaged DC technology
easily to the state-of-the-art pulse power control technology.
SIPP2000IPC-HPPMS provides you the most stable pulsed voltage and current output waveforms by means
of the flexible pulse control parameters to meet your versatile applications.
SIPP2000IPC-HPPMS can be locally controlled with a touch panel using the MELEC GmbH control
software (developed with National Instruments LabVIEW) or can be remotely controlled through
one of the serial interfaces: ProfiBUS DP or RS-485 using the MELEC GmbH remote control protocol
version 2.0 and 2.1. One of the main features of SIPP2000IPC2000-HPPMS is the integrated intuitive user
defined pulse generation as well as the synchronization of MELEC GmbH Mid-Frequency (MF) pulse
generators, SIPP2000USB-MF, for superimposition of HiPIMS / HPPMS and MF pulses for single or
dual magnetron sputtering applications.
The quick arc-level control function with arc suppression time less than 2 µs ensures your
applications remain free of any arc damage. Besides the well-known symmetric bipolar output
function, the extraordinary function of asymmetric bipolar output with two
independent DC power supplies has been successfully developed and included as well. The new
superimposed pulsed plasma control concept of your application provides you more opportunities
to obtaining the optimized final solution.
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