Products SIPP2000USB-HPPMS
Superimposed Pulsed Plasma - SIPP2000USB-HPPMS pulse power controller is capable of operating with
any DC power supply with floating outputs to upgrade your current averaged DC technology
easily to the state-of-the-art pulse power control technology.
SIPP2000USB-HPMS provides you the most stable pulsed voltage and current output waveforms by means
of the flexible pulse control parameters to meet your versatile applications.
SIPP2000USB-HPPMS can be locally controlled by any computer, that running WinXP, using the MELEC GmbH
control center (MCC) software (developed with National Instruments LabVIEW™). The MCC is able to controll
the ADL GmbH DC Units or Advanced Energy Inc. PNCL Dual®, with the features: Symmetric ON-OFF of two DC-Units
setting values for voltage, current and power and reading of DC-Unit working parameters. One of the main features of the
SIPP2000USB-HPPMS is the integrated intuitive user defined pulse generation as well as the synchronization
of MELEC GmbH Mid-Frequency (MF) pulse generators, SIPP2000USB-MF, for superimposition of HiPIMS / HPPMS
and MF pulses for single or dual magnetron sputtering applications.
The quick arc-level control function with arc suppression time less than 2 µs ensures your
applications remain free of any arc damage. Besides the well-known symmetric bipolar output
function, the extraordinary function of asymmetric bipolar output with two
independent DC power supplies has been successfully developed and included as well. The new
superimposed pulsed plasma control concept of your application provides you more opportunities
to obtaining the optimized final solution.
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