Products SIPP2000USB-MF
Superimposed Pulsed Plasma - SIPP2000USB-MF pulse power controller is capable of operating with
any DC power supply with floating outputs to upgrade your current averaged DC technology
easily to the state-of-the-art pulse power control technology.
SIPP2000USB-MF provides you the most stable pulsed voltage and current output waveforms
by means of the flexible pulse control parameters to meet your versatile applications.
SIPP2000USB-MF can be locally controlled by using the MELEC GmbH control center (MCC) software
(developed with National Instruments LabVIEW™). The MCC is able to controll
the ADL GmbH DC Units or Advanced Energy Inc. PNCL Dual® DC Units, with the features: Symmetric
ON-OFF of two DC-Units setting values for voltage, current and power and reading of DC-Unit working
parameters.. One of the main features of SIPP2000USB-MF is the MF pulse generation for the
synchronization of superimposition of HiPIMS / HPPMS and MF pulses for single or dual magnetron
sputtering applications.
The quick arc-level control function with arc suppression time less than 2 µs ensures your
applications remain free of any arc damage. Besides the well-known symmetric bipolar output
function, the extraordinary function of asymmetric bipolar output with two
independent DC power supplies has been successfully developed and included as well. The new
superimposed pulsed plasma control concept of your application provides you more opportunities
to obtaining the optimized final solution.
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