Applications

/Applications

The Concept

2018-06-25T12:13:39+00:00

Introduction MELEC’s DC-Pulse Power Controller is developed to provide the most flexible and stable DC Pulse Controller for Plasma Surface [...]

The Concept 2018-06-25T12:13:39+00:00

HiPIMS

2018-06-25T12:15:03+00:00

HiPIMS – High Power Impulse Magnetron Sputtering High Power Impulse Magnetron Sputtering (HiPIMS), also known as High Power Pulse Magnetron [...]

HiPIMS 2018-06-25T12:15:03+00:00

HiPIMS + DC

2018-06-25T12:16:13+00:00

HiPIMS processes are known for increasing the ionization rate of the sputtered species, thus enabling the magnetron sputtering technology with a [...]

HiPIMS + DC 2018-06-25T12:16:13+00:00

HiPIMS + Bias

2018-06-25T12:26:23+00:00

The HiPIMS + Bias application is a single or dual magnetron application using a conductive substrate. This application allows a variation [...]

HiPIMS + Bias 2018-06-25T12:26:23+00:00

HiPIMS + MF

2018-06-25T12:34:25+00:00

The HiPIMS + MF application superimpose a HiPIMS pulse with a synchronized MF pulse during the off time of the HiPIMS [...]

HiPIMS + MF 2018-06-25T12:34:25+00:00