The Concept
MLad172021-12-09T09:22:42+01:00Introduction MELEC’s DC-Pulse Power Controller is developed to provide the most flexible and stable DC Pulse Controller for Plasma Surface [...]
Introduction MELEC’s DC-Pulse Power Controller is developed to provide the most flexible and stable DC Pulse Controller for Plasma Surface [...]
HiPIMS processes are known for increasing the ionization rate of the sputtered species, thus enabling the magnetron sputtering technology with a [...]
The HiPIMS + Bias application is a single or dual magnetron application using a conductive substrate. This application allows a variation [...]
The HiPIMS + MF application superimpose a HiPIMS pulse with a synchronized MF pulse during the off time of the HiPIMS [...]
The HiPIMS + MF + Bias application superimposes a HiPIMS pulse with a synchronized MF pulse during the off time of [...]