Technology

/Technology
Technology 2018-06-20T15:37:20+00:00

Patents

  • G. Mark, European Patent # 0 534 068 B1, “Equipment used in plasma- and surface-treatment-technique”, June 30, 1992
  • G. Mark, U.S Patent # 6,735,099 B2, “Power Supply Unit for Bipolar Power Supply”, April 17, 2001
  • R. Bandorf, G. Mark, M. Vergöhl, PCT WO 2008/106956 A2, “Magnetron Plasma System”, March 6, 2008
  • G. Mark, Taiwan Patent # 90101276256765, ”Bipolar Power Supply“, January 19, 2001
  • G. Mark, China Patent # 01808196.7 and # 100433530 C, ”Power Supply Unit for Bipolar Power Supply“, April 17, 2001
  • G. Mark, Japan Patent # 2001-577694 3803064, ” Power Supply Unit for Bipolar Power Supply“, April 17, 2001

Papers

  • M. Griepentrog a, B. Mackrodt a, G. Mark b, T. Linz b, “Properties of TiN hard coatings prepared by unbalanced magnetron sputtering and cathodic arc deposition using a uni- and bipolar pulsed bias voltage”, Surface and Coatings Technology 74-75 (1995) 326-332
  • D. Kurapov, D. Neuschütz, R. Cremer, T. Pedersen, M. Wuttig, D. Dietrich, G. Marx, J.M. Schneider, “Synthesis and mechanical properties of BCN coatings deposited by PECVD”, Vacuum 68 (2003) 335-339
  • G. Mark, “Use and Application of DC Pulse Power Supplies with Superior Plasma Instant Kinetics Energy”, printed and published MELEC GmbH (June 2003)
  • H. Bäcker, J.W. Bradley, “Observations of the long-term plasma evolution in a pulsed dc magnetron discharge”, Plasma Sources Sci. Technol. 14 (2005) 419-431
  • K. Bobzin, E. Lugschneider, M. Maes, “The effect of pulse sequence modulation and pulse energy on structural coating properties and coating composition”, Surface Coatings Technology, vol. 200, issues 5-6, 21st November (2005) 1560-1565
  • J. Alami, K. Sarakinos, G. Mark, M. Wuttig, “On the deposition rate in a high power pulsed magnetron sputtering discharge”, Applied Physics Letters 89, 154104 (2006)
  • R. Bandorf, M. Vergöhl, K. Schiffmann, “Investigation of reactively sputtered Titania thin films prepared by DC, pulsed and highly ionized pulsed power magnetron sputtering.”, Society of Vacuum Coaters. 49th Annual Technical Conference 2004. Proceedings, Dallas, USA. Albuquerque: SVC, 21, (2006)
  • A. Anders, J. Andersson, D. Horwat, A. Ehiasarian, “Physics of High Power Impulse Magnetron Sputtering”, The 9th International Symposium on Sputtering & Plasma Processes – ISSP 2007, Kanazawa, Japan, June 6-8, 2007, 195-200 (2007).
  • A. Anders, J. Andersson, D. Horwat, A.P. Ehiasarian, “High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering”, J. Appl. Phys. 102 (2007) 113303,
  • K. Sarakinos, J. Alami, M. Wuttig, “Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering”, Journal of Physics D: Applied Physics 40 (2007) 2108-2114
  • M. Vergoehl, R. Bandorf, and P. Giesel, ” High Power Pulse Magnetron Sputtering: A New Process for Industrial High Quality Optical Coatings?,” in Optical Interference Coatings, OSA Technical Digest (CD) (Optical Society of America, 2007), paper MB7.
  • R. Bandorf, M. Vergöhl, P. Giesel, T. Wallendorf, G. Mark, “Investigation of HPPMS Titania Thin Films Prepared by Unipolar, DC-Superimposed and Bipolar Sputtering”, SVC 50th Annual Technical Conference Proceedings (2007) ISSN 0737-5921
  • R. Bandorf1*, S. Falkenau1*, V. Schmidt1*, G. Mark2*, “Modifications of Coatings by DC-Sputtering with Superimposed HPPMS”, 50th Annual Technical Conference Proceedings of the Society of Vacuum coaters, pp. 477-479, (2007)
  • K. Sarakinos, J. Alami, C. Klever, M. Wuttig, “Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide”, Surface & Coatings Technology 202 (2008) 5033-5035
  • K. Sarakinos, J. Alami, J. Dukwen, J. Woerdenweber, M. Wuttig, “A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering“, Journal of Physics D: Applied Physics 41 (2008) 215301 (9pp)
  • K. Sarakinos, J. Wördenweber, F. Uslu, P. Schulz, J. Alami, M. Wuttig, “The effect of the microstructure and the surface topography on the electrical properties of thin Ag films deposited by high power pulsed magnetron sputtering”, Surface & Coatings Technology 202 (2008) 2323-2327
  • Michael Vergöhl, Oliver Werner, Stefan Bruns, “New developments in magnetron sputter processes for precision optics”, Advances in Optical Thin Films III. Edited by Kaiser, Norbert; Lequime, Michel; Macleod, H. Angus. Proceedings of the SPIE, Volume 7101, pp. 71010B-71010B-17, (2008)
  • M. Vergöhl, O. Werner, S. Bruns, T. Wallendorf, G. Mark, “Superimposed MF-HiPIMS Processes for the Deposition of ZrO2 Thin Films”, SVC 51st Annual Technical Conference Proceedings, Chicago, 19-24th April (2008) ISSN 0737-5921
  • Joakim Andersson and Andre´ Anders, “Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator” Physical Review Letters 102 (2009) 045003
  • André Anders, “Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics”, J. Vac. Sci. Technol. A 28, 783 (2010)
  • K. Sarakinos a,*,1, J. Alami b,1, S. Konstantinidis c,1 “High power pulsed magnetron sputtering: A review on scientific and engineering state of the art“, Sufrace and Coatings Technology, vol. 204, issue 11, 1661-1684 (2010)
  • G. Mark, E. Parra, R. Bandorf, M. Vergöhl, “New superimposed pulsed plasma technology using High Power Impulse Magnetron Sputtering (HiPIMS) combined with DC or MF-frequency”, Proceedings of the 53rd Annual Technical Conference Society of Vacuum Coaters (2010) pp. 224-228