Join our SIPP – SUPERIMPOSED PULSE POWER – Technology

Melec GmbH develops and produces power supplies for plasma applications. Our generators are designed to provide researchers and engineers with the most flexible and stable tool available on the market. All our power supplies can be used for HiPIMS, MF (Mid Frequency) or Bias and DC sputter applications. They are primarily used to generate highly ionized plasma discharges, often referred to as “High Power Impulse Magnetron Sputtering” or HiPIMS.

The core of our technology is the SIPP (Superimposed Pulse Power Technology) technology. It offers the unique opportunity to merge different processes in a hybrid process. For example, HiPIMS can be combined with medium frequency or DC read more.

With over 20 years of experience in plasma coating technology we are the right partner for your next project.