SPIK3000A: HiPIMS 5kW – 30kW
SPIK3000A pulse power controller is capable of operating with any DC power supply with floating outputs to upgrade a current averaged DC technology easily to the state-of-the-art pulse-power-control technology.
The SPIK3000A is the next evolution step in the SPIK line and provides an integrated function generator (FPPG) to generate up to 8 pulses in on-/off-time and polarity. Up to five SPIK3000A can be synchronized to switch parallel, for higher peak current (up to 5000A peak).
SPIK3000A provides the most stable pulsed voltage and current output waveforms. The SPIK3000A is controlled via serial communication and has the option to integrate any standard industrial communication interface. The quick arc-level-control-function with arc suppression time, less than 2µs ensures that applications remain free of any arc damage. The new concept to control the real instant kinetics of the application provides more opportunities to obtain your optimized final solution.
Powerful Waveform Generation: highly customizable waveforms with frequencies up to 50 kHz for diverse applications.
Scalable Power: Run multiple units in parallel for increased power and peak current; synchronized arc management enables coordinated operation
High Flexibility: one generator for DC, pulsed DC / MF, and HiPIMS. Supports Unipolar Mode (+/-) and Bipolar Mode.
Efficient Cooling: Water-cooled design for compact form factor and high power density.
Advanced Synchronization Features enables powerful combination processes such as HiPIMS + MF, HiPIMS + RF;
Power Multiple Cathodes: with precisely timed pulses;
Synchronize cathode(s) with pulsed Bias.
Easy Retrofit: Upgrade any existing DC process to a pulsed application.
Fast Arc Management: Quick response times (less than 2 µs) to ensure minimal arc damage
Seamless System Integration:
easily integrates into existing setups, enabling cutting edge combination processes and enhancing deposition capabilities.
Advanced Waveform Generation:
Offers precise control over waveforms, allowing for tailored thin film properties and optimized performance for various applications.
Cost-Effective Retrofit Solution:
Easily retrofits existing magnetrons powerd by DC, making HiPIMS deposition affordable and accessible without requiring large hardware investments.
Flexible Control & Automation:
Use our intuitive software for easy device control or seamlessly integrate into your existing automation system through popular fieldbus protocols or classic serial communication.
Enhanced Current Density:
Achieve high current densities for superior film quality and improved deposition efficiency, enhancing the overall performance of your applications.
Hard Coatings:
HiPIMS is used in the production of hard coatings for tools and components that require enhanced durability and resistance to wear and corrosion.
Optical Coatings:
In the field of optical coatings, HiPIMS enables the creation of thin, precise layers for optical systems.
Decorative Coatings:
HiPIMS also plays a significant role in decorative coatings for a variety of consumer and industrial products.
SPIK3000A can be adopted for a variaty of different process in various kinds of superimposed an non super imposed configurations:
- Plasma CVD
- Plasma Diffusion
- Plasma Nitriding
- Plasma Etching
- Plasma Cleaning
- Plasma Electrolytic Oxidation ( PEO )
- HiPIMS
- HiPIMS + MF
- HiPIMS + RF
- HiPIMS + Bias
- Bias
- Pulsed DC
