Technology

The Concept

2024-04-16T10:22:28+02:00

Introduction MELEC’s DC-Pulse Power Controller is developed to provide the most flexible and stable DC Pulse Controller for Plasma Surface [...]

The Concept2024-04-16T10:22:28+02:00

HiPIMS

2021-05-06T09:08:26+02:00

HiPIMS – High Power Impulse Magnetron Sputtering High Power Impulse Magnetron Sputtering (HiPIMS), also known as High Power Pulse Magnetron [...]

HiPIMS2021-05-06T09:08:26+02:00

HiPIMS + DC

2021-05-18T12:49:18+02:00

HiPIMS processes are known for increasing the ionization rate of the sputtered species, thus enabling the magnetron sputtering technology with a [...]

HiPIMS + DC2021-05-18T12:49:18+02:00

HiPIMS + Bias

2018-06-25T12:26:23+02:00

The HiPIMS + Bias application is a single or dual magnetron application using a conductive substrate. This application allows a variation [...]

HiPIMS + Bias2018-06-25T12:26:23+02:00

HiPIMS + MF

2018-06-25T12:34:25+02:00

The HiPIMS + MF application superimpose a HiPIMS pulse with a synchronized MF pulse during the off time of the HiPIMS [...]

HiPIMS + MF2018-06-25T12:34:25+02:00
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