Process Synchronisation
SYNC – Type: 2 – 8 Channels
Advanced Synchronization for Precision Thin-Film Coatings Unlock the full potential of your coating and plasma diagnostics with synchronized Melec HiPIMS, MF, and Bias generators.
Optimized synchronization enhances deposition rates, improves process stability, and enables entirely new layer properties.
The Melec SYNC system synchronizes up to eight plasma generators (with optional additional channels) or diagnostic devices (OES, etc.) using arbitrary function generators (AWFG).
Melec’s specialized software provides complete system control, allowing users to generate, store, and load high-resolution synchronized pulse trains. Operate in manual mode or integrate seamlessly with a higher-level PLC controller via serial interface or optional Profibus DP. Automated PLC-driven processes enable multi-stage plasma applications with state-of-the-art pulse sequencing.
With a range of preconfigured synchronization options, the system is flexible and expandable to meet your specific needs. Let us tailor the solution for you!
- 1-microsecond resolution (finer available upon request)
- Bias synchronization feature
- HiPIMS synchronized with MF, DC or RF power supplies
- Serial Interface (RS485) / Profibus for PLC integration
- Synchronize HiPIMS/MF or Bias Generators
- Synchronize other devices like OES Systems
- Tailored software enhancements available on request.
- sequence a multitude of pulse trains for advanced thin film recipes
- Synchronize up to four devices for up to 8 Channels (more optional)
Enhanced Coating Performance:
Optimized synchronization increases deposition rates, improves process stability, and enables new layer properties.
Versatile Synchronization:
Supports HiPIMS, MF, DC, and RF power supplies for broad application flexibility. Synchronizes up to eight plasma generators or diagnostic devices.
Automation:
Easily integrates with PLC systems via Serial Interface (RS485) or Profibus DP, allowing automated multi-stage plasma processes.
Customizable & Scalable:
Expandable synchronization capabilities, tailored software enhancements, and optional additional channels to meet specific needs.
HiPIMS + MF
The combination of HiPIMS with Medium Frequency (MF) sputtering enhances deposition efficiency while maintaining the superior film properties of HiPIMS. By integrating MF power, the process stabilizes plasma conditions, reduces arcing, and increases deposition rates.
HiPIMS + DC
Achieve smoother, denser coatings without sacrificing deposition speed. The HiPIMS + DC hybrid approach boosts coating rates while preserving the advanced film properties of HiPIMS. Retrofit existing DC sputter systems and elevate performance with this cutting-edge technology.
HiPIMS + BIAS
Enhancing thin-film coatings with HiPIMS + Bias allows for greater control over film properties. Applying bias voltage during deposition improves adhesion, density, and structural precision, making it ideal for applications that require high-performance coatings. Whether optimizing wear resistance, fine-tuning superconducting materials, or achieving uniform surfaces, this approach helps deliver reliable, high-quality results.
- PVD
- PECVD
- PEO
