DC PULSE POWER SUPPLIES

Join our SIPP – SUPERIMPOSED PULSE POWER – Technology

Melec GmbH develops and produces power supplies for plasma applications. Our generators are designed to provide researchers and engineers with the most flexible and stable tool available on the market. All our power supplies can be used for HiPIMS, MF (Mid Frequency) or Bias and DC sputter applications. They are primarily used to generate highly ionized plasma discharges, often referred to as “High Power Impulse Magnetron Sputtering” or HiPIMS.

The core of our technology is the SIPP (Superimposed Pulse Power Technology) technology. It offers the unique opportunity to merge different processes in a hybrid process. For example, HiPIMS can be combined with medium frequency or DC.

With over 25 years of experience in plasma coating technology we are the right partner for your next project.

Manufacture of Power Supplies for HiPIMS/HIPIMS

Tailor made solutions for Pulsed Plasma Applications

Support, installation and on site training for coating applications

PRODUCTS

SPIK3000A

SPIK3000A pulse power controller is capable of operating with any DC power supply with floating outputs to upgrade a current averaged DC technology easily to the state-of-the-art pulse-power-control technology.

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DC Power Supplies

Air cooled DC Sources: 0,5kW – 3kW
Water cooled DC Sources: 5kW – 15kW
Water cooled DC Sources: 15kW – 35kW

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Process Synchronisation

Synchronize all Melec HiPIMS, MF and Bias generators to achieve the most advanced thin-film coatings. Synchronized processes enable many new, exciting options for your coating and plasma diagnostics.

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Measurement System

MELECs Measurement System (MS) is a simple way to scope your process. The MS has the option to measure up to four channels ( 2 x U and 2 x I) with a ratio of 1000V:10V and up to 1000A:10V.

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TECHNOLOGY

MELEC’s DC-Pulse Power Controller is developed to provide the most flexible and stable DC Pulse Controller for Plasma Surface Engineering on the market.

Flexible programming and synchronization and a wide range of software features gives researchers and engineers a tool that is unique worldwide. Every model of MELEC’s DC-Pulse Power Controller can be used for HiPIMS, MF or Bias applications.