HiPIMS + MF + Bias

//HiPIMS + MF + Bias

HiPIMS + MF + Bias

The HiPIMS + MF + Bias application superimposes a HiPIMS pulse with a synchronized MF pulse during the off time of the HiPIMS period and synchronizes the Bias.  This application works like a master/slave configuration.

The HiPIMS generator will be the master and triggers the slave (MF and Bias) with the synchronized pulse signal.

Advantages

  • High performance of thin film structure
  • High deposition rates
  • Stable coating processes
  • Preventing arcing and poisoning
  • Single or dual magnetron application

HiPIMS + MF + BIAS

Example Applications

  • Hard Coating
  • Decorative coating
2018-06-25T13:13:52+00:00